The invention is directed to a process for metallizing a surface of a substrate with electrolytically plated copper metallization, the process comprising electrolytically depositing copper over the electrically conductive polymer by immersing the substrate in an electrolytic composition and applying an external source of electrons, wherein the electrolytic composition comprises a source of copper ions to provide a copper ion concentration between about 5 and about 70 g/L, and an acid, and has a pH between about 1.5 and about 3.5.