ÉLÉMENT SEMI–CONDUCTEUR EN DIAMANT ET SON PROCÉDÉ DE FABRICATION

N° de brevet: EP1895579 (A1)
Date de publication: 2008-03-05
Inventeur(s): KASU MAKOTO [JP];MAKIMOTO TOSHIKI [JP];UEDA KENJI [JP];YAMAUCHI YOSHIHARU [JP];
Demandeur(s): NIPPON TELEGRAPH &;TELEPHONE [JP];
Classification: H01L21/338;C23C16/27;C30B29/04;H01L21/331;H01L29/73;H01L29/812;H01L33/00;
N° de demande: EP20060766995 20060620 
Numéro(s) de priorité: WO2006JP312334 20060620;JP20050179751 20050620;JP20050270541 20050916;JP20050307231 20051021;JP20060061838 20060307 
In a conventional diamond semiconductor element, because of high density of crystal defects, it is impossible to reflect the natural physical properties peculiar to a diamond, such as high thermal conductivity, high breakdown field strength, high-frequency characteristics and the like, in the transistor characteristics. By slightly shifting surface orientation of a diamond substrate in a [001] direction, a significant reduction in crystal defects peculiar to a diamond is possible. The equivalent effects are also provided by shifting surface orientation of a single-crystal diamond thin-film or channel slightly from a [001] direction. It is possible to obtain a significantly high transconductance gm as compared with that in a transistor produced using conventional surface orientation.

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