DISPERSION DE SiO2 CREUX, COMPOSITION D' ENDUCTION, ET SUBSTRAT AVEC FILM D' ENDUCTION ANTIREFLET

N° de brevet: EP1887059 (A1)
Date de publication: 2008-02-13
Inventeur(s): KAWAI YOHEI [JP];YONEDA TAKASHIGE [JP];
Demandeur(s): ASAHI GLASS CO LTD [JP];
Classification: B05D5/06;B05D7/24;B32B7/02;B32B27/20;C01B33/18;C09D5/00;C09D7/12;C09D17/00;C09D201/00;G02B1/11;
N° de demande: EP20060729565 20060320 
Numéro(s) de priorité: WO2006JP305597 20060320;JP20050162487 20050602 
To provide a dispersion of hollow SiO 2 , capable of obtaining, when formed into a coating composition, an antireflection film having high antireflection properties and low chroma saturation by forming a low refractive index coating film having a refractive index gradient. A dispersion of fine silica particles, having agglomerated particles which are agglomerates of primary fine particles of hollow SiO 2 dispersed in a dispersion medium, wherein the average particle size of the agglomerated particles is within a range of from 60 to 400 nm, and the average particle size is at least 1.5 times the average primary particle size of the silica. When a coating composition containing the dispersion is to be obtained, the matrix component is preferably a precursor of a metal oxide or an organic resin. By applying the coating composition to a substrate, a substrate with an antireflection coating film is obtained.

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