POLISSAGE ÉLECTROLYTIQUE PAR MEMBRANES À MOTIF TOPOGRAPHIQUE
| N° de brevet: |
EP1880044 (A1) |
| Date de publication: |
2008-01-23 |
| Inventeur(s): |
MAZUR STEPHEN [US];JACKSON CHARLES E [US];FOGGIN GARY W [US]; |
| Demandeur(s): |
DU PONT [US]; |
| Classification: |
C25F3/00;C25F7/00;B23H3/06;B23H3/08;B23H3/00; |
| N° de demande: |
EP20060751828 20060428 |
| Numéro(s) de priorité: |
WO2006US16338 20060428;US20050676338P 20050429 |
A metallic copper and resin composite body manufacturing method of forming a copper wiring layer that forms an inner layer circuit, establishing an insulating layer with a resin on said wiring layer, forming via holes which expose the copper surface under the insulative layer, and depositing a metal on the copper surface that is exposed at the bottom of the via holes. The method includes a step of: removing copper oxide which forms on the surface of the copper that is exposed in the bottom of the via holes using a phosphoric acid aqueous solution with a pH between 1 and 3. The method suppresses haloing is and via holes with excellent solder bonding are formed.
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