POLISSAGE ÉLECTROLYTIQUE PAR MEMBRANES À MOTIF TOPOGRAPHIQUE

N° de brevet: EP1880044 (A1)
Date de publication: 2008-01-23
Inventeur(s): MAZUR STEPHEN [US];JACKSON CHARLES E [US];FOGGIN GARY W [US];
Demandeur(s): DU PONT [US];
Classification: C25F3/00;C25F7/00;B23H3/06;B23H3/08;B23H3/00;
N° de demande: EP20060751828 20060428 
Numéro(s) de priorité: WO2006US16338 20060428;US20050676338P 20050429 
A metallic copper and resin composite body manufacturing method of forming a copper wiring layer that forms an inner layer circuit, establishing an insulating layer with a resin on said wiring layer, forming via holes which expose the copper surface under the insulative layer, and depositing a metal on the copper surface that is exposed at the bottom of the via holes. The method includes a step of: removing copper oxide which forms on the surface of the copper that is exposed in the bottom of the via holes using a phosphoric acid aqueous solution with a pH between 1 and 3. The method suppresses haloing is and via holes with excellent solder bonding are formed.

Copyright © 2008 Patfr.com Tous droits réservés. Contact