CLICHE TYPOGRAPHIQUE EN RESINE PHOTODURCIE.
| N° de brevet: |
EP0483378 (A1) |
| Date de publication: |
1992-05-06 |
| Inventeur(s): |
TSUCHIYA HIROYUKI [JP];ANAI KOUSI [JP]; |
| Demandeur(s): |
ASAHI CHEMICAL IND [JP]; |
| Classification: |
G03F7/095; |
| N° de demande: |
EP19910909145 19910521 |
| Numéro(s) de priorité: |
WO1991JP00676 19910521;JP19900129211 19900521 |
Résumé dans la langue de publication, traduction non disponible There is disclosed a photo-set resin letterpress characterized in that the said letterpress includes a relief layer having a base layer (A) formed by photo-setting and a top layer (B) in that order, and the thickness of the relief layer of a highlight portion constituting a pattern, in which a dot percent is less than 7 %, is less than the thickness of the relief layer of a portion other than the highlight portion. The photo-set resin letterpress according to the present invention has a liquefied photo-sensitive resin layer of a minimum insoluble light quantity (QA ) as a bottom layer and a liquefied photo-sensitive resin layer of a minimum insoluble light quantity (QB ) as a top layer, and a multi-layer photo-sensitive resin layer in which QB is more than 23 millijoule/cm**2 and more than five times the QA can be obtained by the exposure through of image. By use of the photo-set resin letterpress according to the present invention, the highlight portion can be prevented from thickening and a printing pressure can be applied, so that high printing quality which is bright and rich in gradation can be obtained. (see diagramm 1 page 0)
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